Hidden
Surface Analysis by Auger and X-ray Photoelectron Spectroscopy
Introduction
Chapter 1. Perspectives on XPS and AES: Dave Briggs & John Grant
Chapter 2. XPS: Basic Principles, Spectral Features and Qualitative Analysis: Dave Briggs
Chapter 3. AES: Basic Principles, Spectral Features and Qualitative Analysis: John Grant
Instrumentation
Chapter 4. Specimen Preparation and Handling: Joe Geller
Chapter 5. XPS: Instrumentation and Performance: Ian Drummond
Chapter 6. AES: Instrumentation and Performance: Masato Kudo
Chapter 7. Instrument Calibration for AES and XPS: Martin Seah
Chapter 8. Analyzing Insulators with XPS and AES: Mike Kelly
Chapter 9. Beam Effects During AES and XPS Analysis: Don Baer, Mark Engelhard, Dan Gaspar, and Scott Lea
Surface Sensitivity
Chapter 10. Electron Transport in Solids: Wolfgang Werner
Chapter 11. Electron Attenuation Lengths: Shigeo Tanuma
Quantification
Chapter 12. Quantification of Nanostructures by Electron Spectroscopy: Sven Tougaard
Chapter 13. Quantification in AES and XPS: Martin Seah
Chapter 14. The Use of Chemometrics in AES and XPS Data Treatment: Bill Stickle
Spectral interpretation
Chapter 15. XPS Lineshapes and Curve-fitting: Neal Fairley
Chapter 16. Chemical effects in XPS: Laszlo Kover
Chapter 17. Chemical Information from Auger Lineshapes: Dave Ramaker
Chapter 18. The Auger parameter: Giuliano Moretti
Chapter 19. Valence bands studied by XPS: Peter Sherwood
Chapter 20. Structural Effects in XPS and AES: Diffraction: Jürg Osterwalder
Chapter 21. Electron backscattering and channeling: Ding Ze-jun & Ryuichi Shimizu
Depth profiling
Chapter 22. XPS/AES sputter depth profiling: Thomas Wagner, Jy Wang, Siegfried Hofmann
Chapter 23. Angle resolved: Peter Cumpson
Imaging
Chapter 24. XPS Imaging: Kateryna Artyushkova+ Julia Fulghum
Chapter 25. Processing, Interpretation and Quantification of Auger Images: Martin Prutton
Developing aspects
Chapter 26. X-ray Photoelectron Spectroscopy and Imaging at Synchrotrons: Giorgio Margaritondo
Chapter 27. Total Reflection X-ray Photoelectron Spectroscopy (TRXPS): Yoshitoki Iijima
Chapter 28. Ion-excited Auger Electron Spectroscopy: John Grant
Chapter 29. Positron-annihilation-induced Auger Electron Spectroscopy: Toshiyuki Ohdaira
Chapter 30. Electron Coincidence Measurements: Steve Thurgate
Chapter 31. Recent Developments in the Theory of Auger Spectroscopy: Peter Weightman
Appendices:
Appendix A: Peak Positions from Mg X-rays and from Al X-rays by Atomic Number
Appendix B: Peak Positions from Mg X-rays and from Al X-rays in Numerical Order
Appendix C: Auger Kinetic Energies and Sensitivity Factors by Atomic Number
Appendix D: Auger Kinetic Energies in Numerical Order
Appendix E. Polymer C 1s Chemical Shifts
Appendix F. Comparing Beam Damage Rates Using Susceptibility Tables
Appendix G. Manufacturers of AES and XPS Systems
Appendix H. Software for Processing AES and XPS Data
Appendix I. Databases
Appendix J. Measurement and Documentary Standards
Appendix K. Internet Resources